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- 1. J. Appl. Phys. 102, 013530 (2007) , “Fluorine-vacancy complexes in Si-SiGe-Si structures”, D. A. Abdulmalik, P. G. Coleman, H. A. W. El Mubarek, and P. AshburnFluorine-vacancy (FV) complexes have been directly observed in the Si0.94Ge0.06 layer in a Si-SiGe-Si structure, using variable-energy positron annihilation spectroscopy (VEPAS). These complexes are linked to the significant reduction of boron diffusion in the SiGe layer via... (Read more)
- 2. Phys. Rev. B 75, 075304 (2007) , “Damage evolution in low-energy ion implanted silicon”, R. Karmouch, Y. Anahory, J.-F. Mercure, D. Bouilly, M. Chicoine, G. Bentoumi, R. Leonelli, Y. Q. Wang, and F. SchiettekatteThe annealing of damage generated by low-energy ion implantation in polycrystalline silicon (poly-Si) and amorphous silicon (a-Si) is compared. The rate of heat release between implantation temperature and 350–500 °C for Si implanted in both materials and for different ions implanted in... (Read more)
- 3. Phys. Rev. B 75, 035309 (2007) , “Role of hydrogen in hydrogen-induced layer exfoliation of germanium”, J. M. Zahler, A. Fontcuberta i Morral, M. J. Griggs, Harry A. Atwater, and Y. J. ChabalThe role of hydrogen in the exfoliation of Ge is studied using cross-sectional transmission electron microscopy, atomic force microscopy, and multiple-internal transmission mode Fourier-transform infrared absorption spectroscopy and compared with the mechanism in silicon. A qualitative model for the... (Read more)
- 4. Appl. Phys. Lett. 89, 152123 (2006) , “Electrical characterization of defects introduced in n-type Ge during indium implantation”, F. D. Auret, P. J. Janse van Rensburg, M. Hayes, J. M. Nel, W. E. Meyer, S. Decoster, V. Matias, and A. VantommeThe authors have employed deep level transient spectroscopy to investigate the defects introduced in n-type Ge during 160 keV indium (In) ion implantation. Our results show that In implantation introduces three prominent electron traps with energy levels at... (Read more)
- 5. Appl. Phys. Lett. 88, 261102 (2006) , “Light-emitting defects and epitaxy in alkali-ion-implanted α quartz”, J. Keinonen, S. Gsiorek, P. K. Sahoo, S. Dhar, and K. P. LiebLight-emitting centers in alkali-ion-implanted quartz have been investigated with respect to the solid phase epitaxial growth of the ion irradiation induced amorphous zone. Cathodoluminescence was studied under the conditions of chemical epitaxy in annealing the samples, implanted with... (Read more)
- 6. J. Appl. Phys. 100, 034911 (2006) , “Thermal evolution of hydrogen related defects in hydrogen implanted Czochralski silicon investigated by Raman spectroscopy and atomic force microscopy”, W. Düngen, R. Job, Y. Ma, Y. L. Huang, T. Mueller, W. R. Fahrner, L. O. Keller, J. T. Horstmann, and H. FiedlerMicro-Raman spectroscopy and atomic force microscopy investigations have been applied on hydrogen implanted p-type Czochralski silicon samples to investigate the hydrogen related defects and their evolution after subsequent annealing. The thermal evolution of interstitial-hydrogen and... (Read more)
- 7. J. Appl. Phys. 100, 023531 (2006) , “Lattice site location and annealing behavior of implanted Ca and Sr in GaN”, B. De Vries, A. Vantomme, U. Wahl, J. G. Correia, J. P. Araújo, W. Lojkowski, and D. KolesnikovWe report on the lattice location of ion-implanted Ca and Sr in thin films of single-crystalline wurtzite GaN. Using the emission channeling technique the angular distributions of particles emitted by the radioactive isotopes 45Ca (t1/2=163.8 d) and... (Read more)
- 8. J. Appl. Phys. 99, 123514 (2006) , “Study of the annealing kinetic effect and implantation energy on phosphorus-implanted silicon wafers using spectroscopic ellipsometry”, Emmanouil Lioudakis, Constantinos Christofides, and Andreas OthonosIn this work, we have studied the changes in the optical properties on crystalline silicon implanted wafers (1×10131×1016 P+/cm2) using an extensive ellipsometric analysis. The effects of implantation energy (20180 KeV) and... (Read more)
- 9. J. Appl. Phys. 99, 123501 (2006) , “Thermal annealing study of swift heavy-ion irradiated zirconia”, Jean-Marc Costantini, Andrée Kahn-Harari, François Beuneu, and François CouvreurSintered samples of monoclinic zirconia (-ZrO2) have been irradiated at room temperature with 6.0 GeV Pb ions in the electronic slowing down regime. X-ray diffraction (XRD) and micro-Raman spectroscopy measurements showed unambiguously that a transition to the "metastable"... (Read more)
- 10. J. Appl. Phys. 99, 093507 (2006) , “Annealing process of ion-implantation-induced defects in ZnO: Chemical effect of the ion species”, Z. Q. Chen, M. Maekawa, A. Kawasuso, S. Sakai, and H. NaramotoZnO single crystals implanted with O+ and B+ ions were studied by positron annihilation and Raman scattering measurements. Positron annihilation results show that vacancy clusters are generated by implantation. For the B+-implanted sample, the vacancy clusters have a... (Read more)
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