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- 1. Appl. Phys. Lett. 89, 112121 (2006) , “Nature and stability of the (100)Si/LaAlO3 interface probed by paramagnetic defects”, A. Stesmans, K. Clémer, V. V. Afanas'ev, L. F. Edge, and D. G. SchlomElectron spin resonance analysis of (100)Si/LaAlO3 structures reveals the absence of a Si/SiO2-type interface in terms of archetypal Si-dangling bond-type Si/SiO2 interface defects (Pb0,Pb1). With no... (Read more)
- 2. Appl. Phys. Lett. 89, 092103 (2006) , “Electron energy barriers at interfaces of GaAs(100) with LaAlO3 and Gd2O3”, V. V. Afanas'ev, A. Stesmans, R. Droopad, M.Passlack, L.F. Edge, D. G. SchlomElectron energy barriers at the interfaces of GaAs(100) with Gd2O3 appear to be insensitive to the Fermi level pinning indicating that charges at interface states are of marginal importance for the band alignment at semiconductor/insulator interfaces. The inferred conduction... (Read more)
- 3. Phys. Rev. B 74, 035112 (2006) , “Charge localization or itineracy at LaAlO3/SrTiO3 interfaces: Hole polarons, oxygen vacancies, and mobile electrons”, R. Pentcheva and W. E. PickettWhile correlated electron behavior is to be expected at oxide interfaces (IFs) involving Mott insulators, we show how strong correlations in the oxygen 2p states may be necessary to account for observed insulating behavior at charged (001)-IFs between the band insulators LaAlO3 and... (Read more)
- 4. Appl. Phys. Lett. 87, 212501 (2005) , “Spin-dependent tunneling through high-k LaAlO3”, V. Garcia, M. Bibes, J.-L. Maurice, E. Jacquet, K. Bouzehouane, J.-P. Contour, A. Barth?l?myWe report on the use of the LaAlO3 (LAO) high-k dielectric as a tunnel barrier in magnetic tunnel junctions. From tunnel magnetoresistance (TMR) measurements on epitaxial La2/3Sr1/3MnO3/LAO/La2/3Sr1/3MnO3 junctions,... (Read more)
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Updated at 2010-07-20 16:50:39
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Bond(35 tags)
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