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- 1. Phys. Rev. B 77, 195204 (2008) , “Identification of antisite carbon split-interstitial defects in 4H-SiC”, J. W. Steeds, W. SullivanA rich variety of optical centers with high energy local vibrational modes has been found in electron-irradiated 4H-SiC in both the as-irradiated and annealed states. These energies have been measured and the annealing dependence of the optical centers has been investigated by low-temperature... (Read more)
- 2. Phys. Rev. B 77, 195203 (2008) , “Creation and identification of the two spin states of dicarbon antisite defects in 4H-SiC”, J. W. Steeds, W. Sullivan, S. A. Furkert, G. A. Evans, P. J. WellmannThis paper deals with the positive identification by low-temperature photoluminescence microspectroscopy of the two spin states of the dicarbon antisites in 4H-SiC. The defects are created by high-dose electron irradiation at room temperature or by subsequent exposure to intense 325 nm radiation at... (Read more)
- 3. Phys. Rev. B 77, 085120 (2008) , “Identification of the carbon antisite in SiC: EPR of 13C enriched crystals”, Pavel G. Baranov, Ivan V. Ilyin, Alexandra A. Soltamova, and Eugene N. MokhovAn electron paramagnetic resonance spectrum with axial symmetry along c axis, spin S=1/2 and strong hyperfine interaction with one carbon atom has been observed in neutron-irradiated and annealed 6H-SiC, 13C isotope enriched. The 13C concentration was... (Read more)
- 4. phys. stat. sol. (b) 245, 1298-1314 (2008) , “EPR identification of intrinsic defects in SiC”, J. Isoya, T. Umeda, N. Mizuochi, N. T. Son, E. Janzen, T. OhshimaThe structure determination of intrinsic defects in 4H-SiC, 6H-SiC, and 3C-SiC by means of EPR is based on measuring the angular dependence of the 29Si/13C hyperfine (HF) satellite lines, from which spin densities, sp-hybrid ratio, and p-orbital direction can be determined over... (Read more)Si SiC diamond| EPR Theory electron-irradiation thermal-meas./anneal-exp.| +1 -1 0(neutral) 1.0eV~ 13C 29Si C1h C3v Carbon Csi D2d EI5/6 HEI1 HEI9/10 P6/7 Silicon T1 Td Tv2a V1/2/3 Vc Vsi antisite dangling-bond mono(=1) motional-effect n-type p-type pair(=2) quartet semi-insulating spin-relaxation triplet vacancy .inp files: SiC/Baranov/Baranov_g.inp SiC/EI5_C1h/5.inp SiC/EI5_C3v/5.inp SiC/EI6_RT/6.inp SiC/HEI10/HEI10a.inp SiC/HEI10/HEI10b.inp SiC/HEI1_C1h/1.inp SiC/HEI9/HEI9a.inp SiC/HEI9/HEI9b.inp SiC/SI5_C1h/4.inp SiC/Ky2/Ky2.inp SiC/Tv2a/Main.INP SiC/Vsi-_II_4H/Main.INP SiC/Vsi-_II_6H/Main.INP SiC/Vsi-_I_4H/Main.INP SiC/Vsi-_I_6H/Main.INP | last update: Takahide Umeda
- 5. Appl. Phys. Lett. 90, 062113 (2007) , “Influence of growth conditions on irradiation induced defects in low doped 4H-SiC epitaxial layers”, I. Pintilie, U. Grossner, B. G. Svensson, K. Irmscher, and B. ThomasNitrogen doped 4H-SiC epitaxial layers were investigated by deep level transient spectroscopy after irradiation with 6 MeV electrons. The influence of C/Si ratio, N doping level, and growth rate on the behavior of the prominent Z1,2 and EH6,7 levels during... (Read more)
- 6. J. Appl. Phys. 101, 013707 (2007) , “Vanadium donor and acceptor levels in semi-insulating 4H- and 6H-SiC”, W. C. Mitchel, W. D. Mitchell, G. Landis, H. E. Smith, Wonwoo Lee, and M. E. ZvanutThe electronic levels of vanadium in semi-insulating 4H- and 6H-SiC have been reinvestigated using temperature dependent Hall effect and resistivity measurements at temperatures up to 1000 K in conjunction with electron paramagnetic resonance (EPR) and optical absorption measurements... (Read more)
- 7. Phys. Rev. B 75, 245202 (2007) , “Identification of positively charged carbon antisite-vacancy pairs in 4H-SiC”, T. Umeda, J. Ishoya, T. Ohshima, N. Morishita, H. Itoh, and A. GaliAn antisite-vacancy pair and a monovacancy are a set of fundamental stable and/or metastable defects in compound semiconductors. Theory predicted that carbon antisite-vacancy pairs would be much more stable in p-type SiC than silicon vacancies and that they would be a common defect. However,... (Read more)
- 8. Phys. Rev. B 75, 085416 (2007) , “Ab initio theoretical study of hydrogen and its interaction with boron acceptors and nitrogen donors in single-wall silicon carbide nanotubes”, A. GaliSilicon carbide nanotubes have a great potential for biological applications. It is of interest to explore the electronic properties of these nanotubes, and how those are modified in the presence of impurities. Hydrogen is a common impurity that can appear during the growth of silicon carbide... (Read more)
- 9. Phys. Rev. B 75, 085208 (2007) , “Clustering of vacancy defects in high-purity semi-insulating SiC”, R. Aavikko, K. Saarinen, F. Tuomisto, B. Magnusson, N. T. Son, and E. JanzénPositron lifetime spectroscopy was used to study native vacancy defects in semi-insulating silicon carbide. The material is shown to contain (i) vacancy clusters consisting of four to five missing atoms and (ii) Si-vacancy-related negatively charged defects. The total open volume bound to the... (Read more)
- 10. Phys. Rev. B 75, 073409 (2007) , “Why thermal H2 molecules adsorb on SiC(001)-c(4×2) and not on SiC(001)-(3×2) at room temperature”, Xiangyang Peng, Peter Krüger, and Johannes PollmannIn a recent experiment, Derycke et al. have made the exciting observation that H2 molecules readily adsorb dissociatively on the c(4×2) but not on the 3×2 surface of SiC(001) at room temperature. To unravel this spectacular reactivity difference, we have investigated a... (Read more)
- 11. Phys. Rev. B 75, 045211 (2007) , “Ab initio supercell calculations on aluminum-related defects in SiC”, A. Gali, T. Hornos, N. T. Son, E. Janzén, and W. J. ChoykeAb initio supercell calculations of the binding energies predict complex formation between aluminum and carbon interstitials in SiC. In high-energy implanted SiC aluminum acceptor can form very stable complexes with two carbon interstitials. We also show that carbon vacancy can be attached to... (Read more)
- 12. Phys. Rev. Lett. 98, 026101 (2007) , “Bonding at the SiC-SiO2 Interface and the Effects of Nitrogen and Hydrogen”, Sanwu Wang, S. Dhar, Shu-rui Wang, A. C. Ahyi, A. Franceschetti, J. R. Williams, L. C. Feldman,, and Sokrates T. PantelidesUnlike the Si-SiO2 interface, the SiC-SiO2 interface has large defect densities. Though nitridation has been shown to reduce the defect density, the effect of H remains an open issue. Here we combine experimental data and the results of first-principles calculations to... (Read more)
- 13. Appl. Phys. Lett. 89, 231906 (2006) , “Threading dislocation reduction by SiGeC domains in SiGe/SiGeC heterostructure: Role of pure edge dislocations”, L. H. Wong, C. Ferraris, C. C. Wong, and J. P. LiuThe authors previously reported an unusual phenomenon of strain relaxation accompanied by a reduction in threading dislocation density (TDD) on a Si0.77Ge0.23 layer grown on top of alternating layers of... (Read more)
- 14. Appl. Phys. Lett. 89, 223502 (2006) , “Identification of trapping defects in 4H-silicon carbide metal-insulator-semiconductor field-effect transistors by electrically detected magnetic resonance”, Morgen S. Dautrich, Patrick M. Lenahan, and Aivars J. LelisIn conventional Si/SiO2-based metal oxide semiconductor devices, performance-limiting semiconductor/dielectric interface traps are localized precisely at the Si/SiO2 boundary. The authors show that in high-quality SiC/SiO2-based devices, this is not necessarily the... (Read more)
- 15. Appl. Phys. Lett. 89, 222103 (2006) , “Comparison of near-interface traps in Al2O3/4H-SiC and Al2O3/SiO2/4H-SiC structures”, Marc Avice, Ulrike Grossner, Ioana Pintilie, Bengt G. Svensson, Ola Nilsen, and Helmer FjellvagAluminum oxide (Al2O3) has been grown by atomic layer deposition on n-type 4H-SiC with and without a thin silicon dioxide (SiO2) intermediate layer. By means of capacitance-voltage and thermal dielectric relaxation current measurements, the interface... (Read more)
- 16. Appl. Phys. Lett. 89, 211114 (2006) , “Site selective studies of Er3+ emission centers in Er-implanted 6H-SiC”, V. Glukhanyuk and A. KozaneckiIn this work the high resolution site selective photoluminescence (PL) using Fourier transform spectrometer and PL excitation spectra near 1.54 µm in Er-implanted 6H-SiC were investigated. Direct evidence for the existence of three different Er3+ emitting centers... (Read more)
- 17. Appl. Phys. Lett. 89, 103519 (2006) , “Observation of a multilayer planar in-grown stacking fault in 4H-SiC p-i-n diodes”, Joshua D. Caldwell, P. B. Klein, Mark E. Twigg, Robert E. Stahlbush, Orest J. Glembocki, Kendrick X. Liu, Karl D. Hobart, and Fritz KubIn-grown stacking faults (IGSFs) are planar defects that do not propagate under either an applied optical or electrical bias; however, their effect upon the electrical characteristics of diodes is not well understood. We present evidence for a multilayered IGSF and discuss its electrical and optical... (Read more)
- 18. Appl. Phys. Lett. 88, 212112 (2006) , “Reliability of thermally oxidized SiO2/4H-SiC by conductive atomic force microscopy”, Patrick Fiorenza and Vito RaineriThe dielectric breakdown (BD) kinetics of silicon dioxide (SiO2) thin films thermally grown on 4H-SiC was determined by comparison between I-V measurements on large area (up to 1.96×105 cm2) metal-oxide-semiconductor structures and... (Read more)
- 19. Appl. Phys. Lett. 88, 191904 (2006) , “Luminescence from Nd- and Dy-ion-implanted 4H–SiC”, Shinji Kawai, Takayoshi Masaki, Yoshimine Kato, and Teruaki MotookaCathodoluminescence (CL) and photoluminescence (PL) properties are studied on neodymium (Nd)- and dysprosium (Dy)-ion-implanted 4HSiC. No appreciable CL and PL can be observed for all as-implanted samples. Strong visible CL due to Nd3+ and Dy3+ is observed only after... (Read more)
- 20. Appl. Phys. Lett. 88, 153509 (2006) , “Deep energy levels in RuO2/4H–SiC Schottky barrier structures”, L. Stuchlikova, D. Buc, L. Harmatha, U. Helmersson, W. H. Chang, I. BelloRuO2/4HSiC Schottky diode structures based on n-type 4HSiC (7×1017 cm3) with stoichiometric RuO2 Schottky contacts were characterized by electrical capacitance-voltage and current voltage methods and deep-level transient... (Read more)
- 21. Appl. Phys. Lett. 88, 121914 (2006) , “Effect of C/Si ratio on deep levels in epitaxial 4H–SiC”, C. W. Litton, D. Johnstone, S. Akarca-Biyikli, K. S. Ramaiah, I. Bhat, T. P. Chow, J. K. Kim, E. F. SchubertChanging the ratio of carbon to silicon during the epitaxial 4HSiC growth is expected to alter the dominant deep level trap, which has been attributed to a native defect. The C/Si ratio was changed from one to six during epitaxial growth of SiC. Diodes fabricated on the epitaxial layer were... (Read more)
- 22. Appl. Phys. Lett. 88, 092108 (2006) , “Hydrogen passivation of carbon Pb like centers at the 3C- and 4H-SiC/SiO2 interfaces in oxidized porous SiC”, J. L. Cantin, H. J. von Bardeleben, Yue Ke, R. P. Devaty, W. J. ChoykeThe effect of forming gas and vacuum annealing on the concentration of carbon dangling bond (PbC) centers at 3C- and 4H-SiC/SiO2 interfaces has been studied by electron paramagnetic resonance (EPR) spectroscopy. Our results show efficient passivation at 400 °C and... (Read more)
- 23. Appl. Phys. Lett. 88, 082113 (2006) , “Effect of charge on the movement of dislocations in SiC”, T. A. G. Eberlein, R. Jones, A. T. Blumenau, S. Öberg, P. R. BriddonSiC bipolar devices show a degradation under forward-biased operation which has been linked with a current induced motion of one of the two glide dislocations having either Si or C core atoms. We have carried out calculations of the core structures and dynamics of partial dislocations in 3C and... (Read more)
- 24. Appl. Phys. Lett. 88, 052110 (2006) , “Lifetime-limiting defects in n– 4H-SiC epilayers”, P. B. Klein, B. V. Shanabrook, S. W. Huh, A. Y. Polyakov, M. Skowronski, J. J. Sumakeris, M. J. O'LoughlinLow-injection minority carrier lifetimes (MCLs) and deep trap spectra have been investigated in n 4H-SiC epilayers of varying layer thicknesses, in order to enable the separation of bulk lifetimes from surface recombination effects. From the linear dependence of the inverse... (Read more)
- 25. Appl. Phys. Lett. 88, 021907 (2006) , “Nitrogen incorporation characteristics on a 4H-SiC epitaxial layer”, Kazutoshi Kojima, Satoshi Kuroda, Hajime Okumura, and Kazuo AraiThe N incorporation characteristics on a 4H-SiC epitaxial layer were reinvestigated. It was found that the desorption process and thermally activated process are aspects of the N incorporation mechanism of 4H-SiC to which attention should be paid. This mechanism depends on both the rate-limiting... (Read more)
- 26. J. Appl. Phys. 100, 113728 (2006) , “Investigation of deep levels in n-type 4H-SiC epilayers irradiated with low-energy electrons”, Katsunori Danno and Tsunenobu KimotoDeep levels in n-type 4H-SiC epilayers have been investigated by deep level transient spectroscopy (DLTS). The Z1/2 and EH6/7 centers are dominant in as-grown samples. After electron irradiation at 116 keV, by which only carbon atoms may be displaced, the... (Read more)
- 27. J. Appl. Phys. 100, 093518 (2006) , “Interaction of micropipes with foreign polytype inclusions in SiC”, M. Yu. Gutkin, A. G. Sheinerman, T. S. Argunova, J. M. Yi, M. U. Kim, J. H. Je, S. S. Nagalyuk, E. N. Mokhov, G. Margaritondo, and Y. HwuSynchrotron phase sensitive radiography, optical and scanning electron microscopies, and color photoluminescence have been used to study the interaction of micropipes with foreign polytype inclusions in 4H-SiC bulk crystals grown on 6H-SiC substrates. This combination of techniques... (Read more)
- 28. J. Appl. Phys. 100, 093507 (2006) , “A view of the implanted SiC damage by Rutherford backscattering spectroscopy, spectroscopic ellipsometry, and transmission electron microscopy”, G. Battistig, N. Q. Khánh, P. Petrik, T. Lohner, L. Dobos, B. Pécz, J. García López, and Y. Morilla4H-SiC single crystalline substrates were implanted at room temperature with 150 keV Al+ ions using fluences of 4×1014, 1×1015, and 2×1015 cm−2 with current density of 2.5 µA cm−2.... (Read more)
- 29. J. Appl. Phys. 100, 053708 (2006) , “Optical cross sections of deep levels in 4H-SiC”, M. Kato, S. Tanaka, M. Ichimura, E. Arai, S. Nakamura, T. Kimoto, and R. PässlerWe have characterized deep levels in 4H-SiC epilayers grown by cold wall chemical vapor deposition by the deep level transient spectroscopy (DLTS) and the optical-capacitance-transient spectroscopy (O-CTS). Four kinds of DLTS peaks were detected in the epilayers. Three of them are identified... (Read more)
- 30. J. Appl. Phys. 100, 053521 (2006) , “Ostwald ripening of interstitial-type dislocation loops in 4H-silicon carbide”, P. O. Å. Persson, L. Hultman, M. S. Janson, and A. HallénThe annealing behavior of interstitial-type basal plane dislocation loops in Al ion implanted 4H-SiC is investigated. It is shown that the loops undergo a dynamical ripening process. For annealing below 1700 °C the total area of dislocation loops increases, indicating that point defects... (Read more)
- 31. J. Appl. Phys. 100, 043706 (2006) , “Electrical properties of unintentionally doped semi-insulating and conducting 6H-SiC”, W. C. Mitchel, W. D. Mitchell, Z. Q. Fang, D. C. Look, S. R. Smith, H. E. Smith, Igor Khlebnikov, Y. I. Khlebnikov, C. Basceri, and C. BalkasTemperature dependent Hall effect (TDH), low temperature photoluminescence (LTPL), secondary ion mass spectrometry (SIMS), optical admittance spectroscopy (OAS), and thermally stimulated current (TSC) measurements have been made on 6H-SiC grown by the physical vapor transport technique... (Read more)
- 32. J. Appl. Phys. 99, 123717 (2006) , “Identification of sulfur double donors in 4H-, 6H-, and 3C-silicon carbide”, S. A. Reshanov, G. Pensl, H. Nagasawa, and A. SchönerSulfur ions are implanted into 6H-, 4H-, and 3C-SiC. Admittance and double correlated deep level transient spectroscopy investigations reveal that S atoms form double donors in SiC, which reside on lattice sites. The number of double donors observed corresponds to the number of... (Read more)
- 33. J. Appl. Phys. 99, 113520 (2006) , “Effects of hydrogen bond redistribution on photoluminescence of a-SiC:H films under thermal treatment”, A. V. Vasin, S. P. Kolesnik, A. A. Konchits, V. I. Kushnirenko, V. S. Lysenko, A. N. Nazarov, A. V. Rusavsky, and S. AshokHydrogenated amorphous silicon carbide (a-SiC:H) films have been deposited using magnetron sputtering technique. An integrated investigation of the effect of vacuum annealing temperature on photoluminescence properties and paramagnetic defects and its correlation with structural... (Read more)
- 34. J. Appl. Phys. 99, 093511 (2006) , “Primary photoluminescence in as-neutron (electron) -irradiated n-type 6H-SiC”, Z. Q. Zhong, D. X. Wu, M. Gong, O. Wang, S. L. Shi, S. J. Xu, X. D. Chen, C. C. Ling, S. Fung, C. D. Beling, G. Brauer, W. Anwand, and W. SkorupaLow-temperature photoluminescence spectroscopy has revealed a series of features labeled S1, S2, S3 in n-type 6H-SiC after neutron and electron irradiation. Thermal annealing studies showed that the defects S1,... (Read more)
- 35. J. Appl. Phys. 99, 093108 (2006) , “Extremely high quantum efficiency of donor-acceptor-pair emission in N-and-B-doped 6H-SiC”, S. Kamiyama, T. Maeda, Y. Nakamura, M. Iwaya, H. Amano, I. Akasaki, H. Kinoshita, T. Furusho, M. Yoshimoto, T. Kimoto, J. Suda, A. Henry, I. G. Ivanov, J. P. Bergman, B. Monemar, T. Onuma, and S. F. ChichibuHigh-efficiency visible light emission in N-and-B-doped 6H-SiC epilayers was observed in photoluminescence measurements at room temperature. The orange-yellow light emission due to the recombination of donor-acceptor pairs (DAPs) has a broad spectrum with a peak wavelength of 576 nm and a... (Read more)
- 36. J. Appl. Phys. 99, 063513 (2006) , “Superscrew dislocations in silicon carbide: Dissociation, aggregation, and formation”, Xianyun MaAn approach to precisely determine the magnitude and the sign of Burgers vectors of superscrew dislocations (including elementary screw dislocations and micropipes) in silicon carbide (SiC) single crystals has been developed. The histogram of Burgers vector values associated with micropipes follows... (Read more)
- 37. J. Appl. Phys. 99, 033701 (2006) , “Diffusion length and junction spectroscopy analysis of low-temperature annealing of electron irradiation-induced deep levels in 4H-SiC”, A. Castaldini, A. Cavallini, L. Rigutti, S. Pizzini, A. Le Donne, and S. BinettiThe effects of low-temperature annealing in 8.2 MeV electron-irradiated 4H-SiC Schottky diodes were investigated. Deep-level transient spectroscopy and minority-carrier diffusion length (Ld) measurements were carried out on not-irradiated samples and on irradiated... (Read more)
- 38. J. Appl. Phys. 99, 023523 (2006) , “Characterization of 6H-SiC surfaces after ion implantation and annealing using positron annihilation spectroscopy and atomic force microscopy”, G. Brauer, W. Anwand, W. Skorupa, S. Brandstetter, and C. TeichertSystematic slow positron implantation spectroscopy (SPIS) and atomic force microscopy studies of various 6H-SiC samples are presented to clarify the role of conductivity type, crystal quality, ion implantation (B+,Al+, and N+), and annealing (1.650 °C) in... (Read more)
- 39. J. Appl. Phys. 99, 013515 (2006) , “Defects and electrical behavior in 1 MeV Si+-ion-irradiated 4H–SiC Schottky diodes”, F. Roccaforte, S. Libertino, V. Raineri, A. Ruggiero, V. Massimino, and L. CalcagnoIn this paper, the formation and evolution of defects induced by ion irradiation with 1 MeV Si+ ions in Ni2Si/4HSiC Schottky diodes were studied and correlated with the electrical properties of the contacts. The current-voltage characteristics of the contacts... (Read more)
- 40. J. Appl. Phys. 99, 013508 (2006) , “Residual impurities and native defects in 6H-SiC bulk crystals grown by halide chemical-vapor deposition”, S. W. Huh, H. J. Chung, S. Nigam, A. Y. Polyakov, Q. Li, M. Skowronski, E. R. Glaser, W. E. Carlos, B. V. Shanabrook, M. A. Fanton, and N. B. SmirnovA variety of defect-sensitive techniques have been employed to detect, identify, and quantify the residual impurities and native defects in high-purity (undoped) 6H-SiC crystals grown by halide chemical-vapor deposition technique. The incorporation efficiencies of N and B are determined by... (Read more)
- 41. J. Appl. Phys. 99, 011101 (2006) , “Degradation of hexagonal silicon-carbide-based bipolar devices”, M. Skowronski and S. HaOnly a few years ago, an account of degradation of silicon carbide high-voltage p-i-n diodes was presented at the European Conference on Silicon Carbide and Related Compounds (Kloster Banz, Germany, 2000). This report was followed by the intense effort of multiple groups... (Read more)
- 42. Phys. Rev. B 74, 245216 (2006) , “Influence of excited states of a deep substitutional dopant on majority-carrier concentration in semiconductors”, Hideharu MatsuuraThe density (NA) and energy level (EA) of an acceptor in a p-type wide-band-gap semiconductor (e.g., SiC, GaN, and diamond) are determined by a least-squares fit of the charge neutrality equation to the temperature dependence of the hole... (Read more)
- 43. Phys. Rev. B 74, 245212 (2006) , “Deactivation of nitrogen donors in silicon carbide”, F. Schmid, S. A. Reshanov, H. B. Weber, G. Pensl, M. Bockstedte, A. Mattausch, O. Pankratov, T. Ohshima, and H. ItohHexagonal SiC is either co-implanted with silicon (Si+), carbon (C+), or neon (Ne+) ions along with nitrogen (N+) ions or irradiated with electrons (e−) of 200 keV energy. During the subsequent annealing step at temperatures above 1450 ... (Read more)
- 44. Phys. Rev. B 74, 245201 (2006) , “Electrical resistivity and metal-nonmetal transition in n-type doped 4H-SiC”, Antonio Ferreira da Silva, Julien Pernot, Sylvie Contreras, Bo E. Sernelius, Clas Persson, and Jean CamasselThe electrical resistivity of 4H-SiC doped with nitrogen is analyzed in the temperature range 10–700 K for nitrogen concentrations between 3.5×1015 and 5×1019 cm−3. For the highest doped samples, a good agreement is found between the... (Read more)
- 45. Phys. Rev. B 74, 235201 (2006) , “Annealing of multivacancy defects in 4H-SiC”, W. E. Carlos, N. Y. Garces, E. R. Glaser, and M. A. FantonThe annealing behavior of defects observed in electron paramagnetic resonance (EPR) and photoluminescence (PL) is discussed. We consider the divacancy (the P6/P7 EPR centers) and a previously unreported EPR center that we suggest is a VC-VSi-VC... (Read more)
- 46. Phys. Rev. B 74, 233203 (2006) , “Combined photoluminescence-imaging and deep-level transient spectroscopy of recombination processes at stacking faults in 4H-SiC”, A. Galeckas, A. Hallén, S. Majdi, J. Linnros, and P. PirouzWe report on electronic properties of single- and double-layer stacking faults in 4H-SiC and provide an insight into apparent distinctions of recombination-enhanced defect reactions at these faults. Photoluminescence imaging spectroscopy and deep-level transient spectroscopy experiments... (Read more)
- 47. Phys. Rev. B 74, 155425 (2006) , “Ab initio study of native defects in SiC nanotubes”, R. J. Baierle, P. Piquini, L. P. Neves, and R. H. MiwaSpin-polarized density functional theory is used to investigate the electronic and structural properties of vacancies and antisites in zigzag, armchair, and chiral SiC nanotubes. Antisites present lower formation energies compared to vacancies, introducing an empty electronic level close to the... (Read more)
- 48. Phys. Rev. B 74, 144106 (2006) , “Density functional theory calculation of the DI optical center in SiC”, T. A. G. Eberlein, R. Jones, S. Öberg, and P. R. BriddonThe DI center is a prominent defect which is detected in as-grown or irradiated SiC. It is unusual in that its intensity grows with heat treatments and survives anneals of 1700 °C. It has been assigned recently to either a close-by antisite pair or to the close-by antisite... (Read more)
- 49. Phys. Rev. B 74, 035309 (2006) , “Structure of the interface between ultrathin SiO2 films and 4H-SiC(0001)”, Mark Schürmann, Stefan Dreiner, Ulf Berges, and Carsten WestphalThe interface between ultrathin SiO2 films and 4H-SiC(0001) has been studied by x-ray photoelectron spectroscopy (XPS) and photoelectron diffraction. The investigation was performed for two different films. An ordered silicate layer showed a clear (×)R30°... (Read more)
- 50. Phys. Rev. B 73, 245415 (2006) , “Ab initio study of nitrogen and boron substitutional impurities in single-wall SiC nanotubes”, A. GaliSilicon carbide nanotubes have a great potential for application in chemical sensors in harsh environment or in biological sensors. It is of interest to explore the electronic properties of these nanotubes, and how those are modified in the presence of impurities. It is well known that nitrogen and... (Read more)
- 51. Phys. Rev. B 73, 214113 (2006) , “Point-defect recombination efficiency at grain boundaries in irradiated SiC”, Andrea Moriani and Fabrizio CleriWe studied the atomic-scale mechanisms of radiation damage recovery, by molecular dynamics simulations of irradiation cascades in a -SiC model system, containing one general (001) twist grain boundary in the direction approximately perpendicular to the cascade. The (001) grain boundary has a... (Read more)
- 52. Phys. Rev. B 73, 161201(R) (2006) , “Thermally stable carbon-related centers in 6H-SiC: Photoluminescence spectra and microscopic models”, A. Mattausch, M. Bockstedte, O. Pankratov, J. W. Steeds, S. Furkert, J. M. Hayes, W. Sullivan, N. G. WrightRecent ab initio calculations [Mattausch et al., Phys. Rev. B 70, 235211 (2004)] of carbon clusters in SiC reveal a possible connection between the tricarbon antisite (C3)Si and the U photoluminescence center in 6H-SiC [Evans et al., Phys. Rev. B 66, 35204... (Read more)
- 53. Phys. Rev. B 73, 125206 (2006) , “Atomistic simulations on the thermal stability of the antisite pair in 3C- and 4H-SiC”, M. Posselt, F. Gao, W. J. WeberThe thermal stability of the first-neighbor antisite pair configurations in 3C- and 4H-SiC is investigated by atomic-level computer simulations. First, the structure and energetics of these defects are determined in order to check the accuracy of the interatomic potential employed. The results are... (Read more)
- 54. Phys. Rev. B 73, 075201 (2006) , “Electron paramagnetic resonance and theoretical studies of shallow phosphorous centers in 3C-, 4H-, and 6H-SiC”, N. T. Son, A. Henry, J. Isoya, M. Katagiri, T. Umeda, A. Gali, E. JanzénContinuous-wave (cw) electron paramagnetic resonance (EPR) at both X-band and W-band frequencies, pulsed-EPR, and pulsed electron nuclear double resonance (ENDOR) were used to study phosphorus shallow donors in 3C-, 4H-, and 6H-SiC doped with phosphorus (P) during... (Read more)
- 55. Phys. Rev. B 73, 033204 (2006) , “Electrical characterization of metastable carbon clusters in SiC: A theoretical study”, A. Gali, N. T. Son, E. JanznFirst-principles calculations carried out in 3C- and 4H-SiC show that small metastable carbon clusters can be created in irradiated SiC. The metastable carbon clusters possess occupation levels in the p-type as well as in the n-type 4H-SiC. Depending on the... (Read more)
- 56. Phys. Rev. B 73, 014111 (2006) , “Structure of SiO2/4H-SiC interface probed by positron annihilation spectroscopy”, M. Maekawa, A. Kawasuso, M. Yoshikawa, A. Miyashita, R. Suzuki, T. OhdairaThe structure of the SiO2/4H-SiC interface produced by dry oxidation has been studied using positron annihilation spectroscopy using energy-variable slow positron beams. Based on the Doppler broadening shape and wing parameter (S-W) correlation, the interface layer was... (Read more)
- 57. Phys. Rev. Lett. 96, 55501 (2006) , “Divacancy in 4H-SiC”, N. T. Son, P. Carlsson, J. ul Hassan, E. Janzén, T. Umeda, J. Isoya, A. Gali, M. Bockstedte, N. Morishita, T. Ohshima, H. ItohElectron paramagnetic resonance and ab initio supercell calculations suggest that the P6/P7 centers, which were previously assigned to the photoexcited triplet states of the carbon vacancy-antisite pairs in the double positive charge state, are related to the triplet ground... (Read more)
- 58. Phys. Rev. Lett. 96, 145501 (2006) , “Identification of the Carbon Antisite-Vacancy Pair in 4H-SiC”, T. Umeda, N. T. Son, J. Isoya, E. Janzn, T. Ohshima, N. Morishita, H. Itoh, A. Gali, M. BockstedteThe metastability of vacancies was theoretically predicted for several compound semiconductors alongside their transformation into the antisite-vacancy pair counterpart; however, no experiment to date has unambiguously confirmed the existence of antisite-vacancy pairs. Using electron paramagnetic resonance and first principles calculations we identify the SI5 center as the carbon antisite-vacancy pair in the negative charge state (CSiVC-) in 4H-SiC. We suggest that this defect is a strong carrier-compensating center in n-type or high-purity semi-insulating SiC. (Read more)SiC| ENDOR EPR Theory electron-irradiation optical-spectroscopy thermal-meas./anneal-exp.| -1 -2 1.0eV~ 13C 29Si C1h C3v Carbon Csi EI5/6 HEI1 HEI5/6 Nitrogen P6/7 SI5 Silicon Vc antisite bistable/metastable dangling-bond n-type pair(=2) semi-insulating vacancy .inp files: SiC/SI5_C1h SiC/SI5_80K SiC/SI5_100K | last update: Takashi Fukushima
- 59. Physica B 376-377, 358-361 (2006) , “Pulsed EPR studies of Phosphorus shallow donors in diamond and SiC”, J. Isoya, M. Katagiri, T. Umeda, S. Koizumi, H. Kanda, N. T. Son, A. Henry, A. Gali, E. JanzénPhosphorus shallow donors having the symmetry lower than Td are studied by pulsed EPR. In diamond:P and 3C–SiC:P, the symmetry is lowered to D2d and the density of the donor wave function on the phosphorus atom exhibits a predominant p-character. In 4H–SiC:P with the site symmetry of... (Read more)
- 60. AIP Conf. Proc. 772, 89 (2005) , “Deep states of Pt, Ir, and Os in Silicon Carbide”, Joachim Grillenberger, Ulrike Grossner, Bengt G. Svensson, Fanny Albrecht, Wolfgang Witthuhn, Rainer SielemannBand gap states of platinum, iridium, and osmium in 4H silicon carbide (SiC) are investigated with Deep Level Transient Spectroscopy (DLTS). A definite chemical assignment of band gap states to Pt, Ir, and Os was achieved by means of the radiotracer principle: the radioactive isotope... (Read more)
- 61. Appl. Phys. Lett. 87, 242106 (2005) , “Defect-driven inhomogeneities in Ni/4H–SiC Schottky barriers”, S. Tumakha, D. J. Ewing, L. M. Porter, Q. Wahab, X. Ma, T. S. Sudharshan, L. J. BrillsonNanoscale depth-resolved cathodoluminescence spectroscopy (DRCLS) of Ni diode arrays on 4H-SiC epitaxial wafers reveals a striking correspondence between deep level defects and electrical transport measurements on a diode-by-diode basis. Current-voltage measurements display both ideal and nonideal... (Read more)
- 62. Appl. Phys. Lett. 87, 241906 (2005) , “Deep-ultraviolet micro-Raman investigation of surface defects in a 4H–SiC homoepitaxially grown film”, Takuro Tomita, Shigeki Matsuo, Tatsuya Okada, Tsunenobu Kimoto, Hiroyuki Matsunami, Takeshi Mitani, Shin-Ichi NakashimaThe structures of comet defects in a 4HSiC homoepitaxially grown film are investigated by deep-ultraviolet micro-Raman spectroscopy. Spatial distribution of the 4H- and 3CSiC is clearly distinguished both from the intensities of the folded longitudinal acoustic phonon mode and the peak... (Read more)
- 63. Appl. Phys. Lett. 87, 212114 (2005) , “Doping of phosphorus in chemical-vapor-deposited silicon carbide layers: A theoretical study”, T. Hornos, A. Gali, R. P. Devaty, W. J. ChoykeAb initio supercell calculations have been carried out to investigate the doping of phosphorus in chemical-vapor-deposited (CVD) silicon carbide (SiC) layers. We simulated the CVD conditions by using the appropriate chemical potentials for hydrogen and phosphorus (P). We find that the site... (Read more)
- 64. Appl. Phys. Lett. 87, 193110 (2005) , “Initial nitride formation at Si/3C–SiC(100)3×2 interface by oxynitridation”, C. Radtke, H. Enriquez, J. C. Arnault, P. Soukiassian, P. Moras, C. Crotti, P. PerfettiNitric oxide interaction with 3CSiC(100)3×2 and Si-3×2/3CSiC(100)3×2 surfaces is investigated by synchrotron radiation-based core level photoemission spectroscopy. At 25 °C, NO exposures result in oxynitride formation, while annealing at 1000 °C removes oxygen... (Read more)
- 65. Appl. Phys. Lett. 86, 122104 (2005) , “Midgap levels in both n- and p-type 4H–SiC epilayers investigated by deep level transient spectroscopy”, K. Danno, T. Kimoto, and H. MatsunamiMidgap levels in n- and p-type 4HSiC epilayers have been investigated by deep level transient spectroscopy (DLTS). The EH6/7 center (Ec1.55 eV) is the dominant midgap level as observed in DLTS spectra for n-type epilayers. The activation... (Read more)
- 66. Appl. Phys. Lett. 86, 122102 (2005) , “Current transport property of n-GaN/n-6H–SiC heterojunction: Influence of interface states”, Y. Huang, X. D. Chen, S. Fung, C. D. Beling, C. C. Ling, X. Q. Dai, and M. H. XieHeterostructures of n-GaN/n-6HSiC grown by hydride vapor phase epitaxy (HVPE) and molecular-beam epitaxy (MBE) are characterized with the currentvoltage (IV), capacitancevoltage (CV), and deep level transient spectroscopy (DLTS)... (Read more)
- 67. Appl. Phys. Lett. 86, 091903 (2005) , “Observation of recombination enhanced defect annealing in 4H–SiC”, L. Storasta, F. H. C. Carlsson, J. P. Bergman, and E. JanzénWe report observation of recombination enhanced defect annealing in 4HSiC detected by capacitance transient spectroscopy and low temperature photoluminescence (PL). Intrinsic defect centers, created by 160 keV electron irradiation, reduce in concentration after illumination at temperatures... (Read more)
- 68. Appl. Phys. Lett. 86, 061914 (2005) , “Nondestructive characterization of dislocations and micropipes in high-resistivity 6H–SiC wafers by deep-level photoluminescence mapping”, M. Tajima, E. Higashi, T. Hayashi, H. Kinoshita, H. ShiomiWe demonstrated the effectiveness of deep-level photoluminescence (PL) mapping for nondestructive detection of dislocations and micropipes in high-resistivity 6HSiC wafers. PL spectra of the wafers at room temperature were dominated by a broad band with a peak at 1.3 eV, which was traceable... (Read more)
- 69. Appl. Phys. Lett. 86, 031903 (2005) , “Anomalous behaviors of E1/E2 deep level defects in 6H silicon carbide”, X. D. Chen, C. C. Ling, M. Gong, S. Fung, C. D. Beling, G. Brauer, W. Anwand, W. SkorupaDeep level defects E1/E2 were observed in He-implanted, 0.3 and 1.7 MeV electron-irradiated n-type 6HSiC. Similar to others' results, the behaviors of E1 and E2 (like the peak intensity ratio, the annealing... (Read more)
- 70. Appl. Phys. Lett. 86, 023503 (2005) , “Observation of trapping defects in 4H–silicon carbide metal-oxide-semiconductor field-effect transistors by spin-dependent recombination”, David J. Meyer, Patrick M. Lenahan, Aivars J. LelisWe utilize a highly sensitive electron spin resonance technique called spin-dependent recombination to observe deep level dangling bond centers at and very near the SiC/SiO2 interface in fully processed n-channel 4HSiC lateral metal-oxide-semiconductor field-effect... (Read more)
- 71. J. Appl. Phys. 98, 113524 (2005) , “Defect energy levels in hydrogen-implanted and electron-irradiated n-type 4H silicon carbide”, G. Alfieri, E. V. Monakhov, B. G. Svensson, A. HallénUsing deep level transient spectroscopy (DLTS), we have studied the energy position and thermal stability of deep levels in nitrogen doped 4HSiC epitaxial layers after 1.2 MeV proton implantation and 15 MeV electron irradiation. Isochronal annealing was performed at temperatures from 100 to... (Read more)
- 72. J. Appl. Phys. 98, 113506 (2005) , “Swelling of SiC under helium implantation”, S. Leclerc, A. Declémy, M. F. Beaufort, C. Tromas, and J. F. BarbotSingle crystals 4H-SiC were implanted with 50 keV helium ions at temperatures up to 600 °C and fluences in the range 1×10161×1017 cm2. The helium implantation-induced swelling was studied through the measurement of the step height. The... (Read more)
- 73. J. Appl. Phys. 98, 106108 (2005) , “Growth and characterization of SiC epitaxial layers on Si- and C-face 4H SiC substrates by chemical-vapor deposition”, Kodigala Subba Ramaiah, I. Bhat, T. P. Chow, J. K. Kim, E. F. Schubert, D. Johnstone, S. Akarca-BiyikliHigh-quality Schottky junctions have been fabricated on n-type 4H SiC epitaxial layers grown by chemical-vapor deposition on C- and Si-face substrates in order to understand the effect of growth direction on the growth mechanism and formation of defects. Atomic force microscopy... (Read more)
- 74. J. Appl. Phys. 98, 053706 (2005) , “Deep levels by proton and electron irradiation in 4H–SiC”, Antonio Castaldini, Anna Cavallini, Lorenzo Rigutti, Filippo Nava, Sergio Ferrero, Fabrizio GiorgisThe effects on 4H-silicon carbide epilayers of irradiation with protons and electrons having particle energies, respectively, of 6.5 and 8.2 MeV were carefully studied and critically compared. In detail, the electronic levels associated with the irradiation-induced defects were analyzed by... (Read more)
- 75. J. Appl. Phys. 98, 043508 (2005) , “Deep-level defects in n-type 6H silicon carbide induced by He implantation”, C. C.Ling, X. D. Chen, G. Brauer, W. Anwand, W. Skorupa, H. Y. Wang, H. M. WengDefects in He-implanted n-type 6HSiC samples have been studied with deep-level transient spectroscopy. A deep-level defect was identified by an intensity with a logarithmical dependence on the filling pulse width, which is characteristic of dislocation defects. Combined with information... (Read more)
- 76. J. Appl. Phys. 97, 124507 (2005) , “Electrical behavior of 4H-SiC metal-oxide-semiconductor structures with Al2O3 as gate dielectric”, A. Paskaleva, R. R. Ciechonski, M. Syväjärvi, E. Atanassova, R. YakimovaThe electrical properties of Al2O3 as a gate dielectric in metal-oxide-semiconductor structures based on n- and p-type 4H-SiC grown by sublimation method have been investigated and compared to the properties of similar structures utilizing SiO2. The... (Read more)
- 77. J. Appl. Phys. 97, 123509 (2005) , “Observation of a spin one native defect in as-grown high-purity semi-insulating 4H SiC”, M. E. Zvanut, Haiyan Wang, Mpumelelo Richards, and V. V. KonovalovElectron paramagnetic resonance measurements of high-purity semi-insulating 4H SiC reveals a spectrum characteristic of an S=1 defect, which appears only after exposure to light with a wavelength less than 690 nm. Analysis of the hyperfine structure of the spectrum suggests that the defect is... (Read more)
- 78. J. Appl. Phys. 97, 123502 (2005) , “Ion irradiation of inhomogeneous Schottky barriers on silicon carbide”, F. Roccaforte, S. Libertino, F. Giannazzo, C. Bongiorno, F. La Via, and V. RaineriIn this paper, the effects of ion irradiation on Schottky barriers formed on silicon carbide are discussed. After Si-ion irradiation at the near-interface region in Ti/4H-SiC contacts an increase of the Schottky barrier height from 1.05 to 1.21 eV was observed, accompanied by a lowering of the... (Read more)
- 79. J. Appl. Phys. 97, 083529 (2005) , “A method to determine deep level profiles in highly compensated, wide band gap semiconductors”, A. Armstrong, A. R. Arehart, and S. A. RingelA lighted capacitancevoltage (LCV) method for spatially profiling defect levels in wide band gap, highly compensated materials is presented. Combined with deep level optical spectroscopy, the optical nature of the LCV profiling technique enables the quantitative study of lower bounds of... (Read more)
- 80. J. Appl. Phys. 97, 034302 (2005) , “Interfaces between 4H-SiC and SiO2: Microstructure, nanochemistry, and near-interface traps”, Eckhard Pippel, Jörg Woltersdorf, Halldor Ö. Ólafsson, Einar Ö. SveinbjörnssonWe report on electrical and microscopic investigations aimed to clarify the origin of near-interface traps (NITs) in metalsilicon dioxide4H-silicon carbide structures. Using capacitancevoltage and thermal dielectric relaxation current (TDRC) analysis we investigated NITs close to... (Read more)
- 81. J. Appl. Phys. 97, 033702 (2005) , “Recombination-induced athermal migration of hydrogen and deuterium in SiC”, Yaroslav Koshka and Bharat KrishnanThe phenomenon of recombination-induced formation of hydrogen-defect complexes in epitaxial silicon carbide (SiC) was further investigated on p-type samples treated in deuterium plasma. Qualitatively similar effects were observed for hydrogen and deuterium. The formation of hydrogen-related... (Read more)
- 82. J. Appl. Phys. 97, 033513 (2005) , “Fluence, flux, and implantation temperature dependence of ion-implantation-induced defect production in 4H–SiC”, J. Slotte, K. Saarinen, M. S. Janson, A. Hallén, A. Yu. Kuznetsov, B. G. Svensson, J. Wong-Leung, C. JagadishVacancy-type defect production in Al- and Si-implanted 4HSiC has been studied as a function of ion fluence, ion flux, and implantation temperature in the projected ion range region by positron annihilation spectroscopy and Rutherford backscattering techniques. Ion channeling measurements show... (Read more)
- 83. J. Appl. Phys. 97, 013540 (2005) , “Correlation between morphological defects, electron beam-induced current imaging, and the electrical properties of 4H–SiC Schottky diodes”, Y. Wang, G. N. Ali, M. K. Mikhov, V. Vaidyanathan, B. J. Skromme, B. Raghothamachar, M. DudleyDefects in SiC degrade the electrical properties and yield of devices made from this material. This article examines morphological defects in 4HSiC and defects visible in electron beam-induced current (EBIC) images and their effects on the electrical characteristics of Schottky diodes. Optical... (Read more)
- 84. J. Appl. Phys. 97, 013533 (2005) , “Observation of dislocations in diffused 4H–SiC p-i-n diodes by electron-beam induced current”, S. Maximenko, S. Soloviev, D. Cherednichenko, and T. SudarshanThe electron-beam induced current (EBIC) method was employed to investigate the electrical activity of dislocations in silicon-carbide-diffused p-n diodes. It was observed that EBIC contrast depends on the type of defect (superscrew, screw, and edge dislocation). This dependence was... (Read more)
- 85. J. Chem. Phys. 122, 094508 (2005) , “Application of the Wolf damped Coulomb method to simulations of SiC”, Y. Ma and S. H. GarofaliniA multibody interatomic potential is developed for bulk SiC using a modification of the Wolf et al. summation technique [D. Wolf, P. Keblinski, S. R. Phillpot, and J. Eggebrecht, J. Chem. Phys. 110, 8254 (1999)] for the electrostatic interaction. The technique is modified to account for the... (Read more)
- 86. J. Vac. Sci. Technol. B 23, 594 (2005) , “Electronic defect states at annealed metal/4H–SiC interfaces”, S. Tumakha, S. H. Goss, L. J. Brillson, R. S. OkojieWe have used low energy electron-excited nanoscale luminescence spectroscopy (LEEN) to study the formation of electronic surface states at metal/4HSiC contacts. These junctions were formed using both low and high reactivity metals to study how the nature of interface chemical bonding affects... (Read more)
- 87. JETP Lett. 82, 441 (2005) , “EPR Identification of the Triplet Ground State and Photoinduced Population Inversion for a Si-C Divacancy in Silicon Carbide”, P. G. Baranov, I. V. Il’in, E. N. Mokhov, M V. Muzafarova, S. B. Orlinskii, J. Schmidt
- 88. Phys. Rev. B 72, 45204 (2005) , “Electron-positron momentum distributions associated with isolated silicon vacancies in 3C-SiC”, A. Kawasuso, M. Yoshikawa, H. Itoh, T. Chiba, T. Higuchi, K. Betsuyaku, F. Redmann, R. Krause-RehbergTwo-dimensional angular correlation of annihilation radiation (2D-ACAR) and coincidence Doppler broadening (CDB) of annihilation radiation measurements have been performed on electron-irradiated n-type 3C-SiC in which isolated silicon vacancies are responsible for positron trapping.... (Read more)
- 89. Phys. Rev. B 72, 235208 (2005) , “Spin multiplicity and charge state of a silicon vacancy (TV2a) in 4H-SiC determined by pulsed ENDOR”, N. Mizuochi, S. Yamasaki, H. Takizawa, N. Morishita, T. Ohshima, H. Itoh, T. Umeda, and J. IsoyaIn this paper, we unambiguously re-determine the spin multiplicity of TV2a by pulsed electron nucleus double resonance technique. The TV2a center is one of the most commonly observed defects in 4H-SiC, and its origin was... (Read more)
- 90. Phys. Rev. B 71, 193204 (2005) , “Angular correlation of annihilation radiation associated with vacancy defects in electron-irradiated 6H-SiC”, A. Kawasuso, T. Chiba, T. HiguchiElectron-positron momentum distributions associated with vacancy defects in 6H-SiC after irradiation with 2-MeV electrons and annealing at 1000 °C have been studied using angular correlation of annihilation radiation measurements. It was confirmed that the above vacancy defects have... (Read more)
- 91. Phys. Rev. B 71, 193202 (2005) , “EPR and theoretical studies of negatively charged carbon vacancy in 4H-SiC”, T. Umeda, Y. Ishitsuka, J. Isoya, N. T. Son, E. Janzén, N. Morishita, T. Ohshima, H. Itoh, A. GaliCarbon vacancies (VC) are typical intrinsic defects in silicon carbides (SiC) and so far have been observed only in the form of positively charged states in p-type or semi-insulating SiC. Here, we present electron-paramagnetic-resonance (EPR) and photoinduced EPR (photo-EPR)... (Read more)
- 92. Phys. Rev. B 71, 174113 (2005) , “Atomistic mechanisms of amorphization during nanoindentation of SiC: A molecular dynamics study”, Izabela Szlufarska, Rajiv K. Kalia, Aiichiro Nakano, and Priya VashishtaAtomistic mechanisms underlying the nanoindentation-induced amorphization in SiC crystal has been studied by molecular dynamics simulations on parallel computers. The calculated load-displacement curve consists of a series of load drops, corresponding to plastic deformation, in addition to a... (Read more)
- 93. Phys. Rev. B 71, 165210 (2005) , “Ion-implantation-induced extended defect formation in (0001) and (11-20) 4H-SiC”, J. Wong-leung, M. K. Linnarsson, B. G. Svensson, D. J. H. CockayneWe study the effect of substrate orientation namely (110) and (0001) oriented crystals on defect formation in 4H-SiC. The microstructure of the various samples, as-implanted with P and annealed, were studied by Rutherford backscattering spectrometry and channeling and transmission electron... (Read more)
- 94. Phys. Rev. B 71, 125202 (2005) , “Positively charged carbon vacancy in three inequivalent lattice sites of 6H-SiC: Combined EPR and density functional theory study”, V. Ya. Bratus', T. T. Petrenko, S. M. Okulov, and T. L. PetrenkoThe Ky1, Ky2, and Ky3 centers are the dominant defects produced in the electron-irradiated p-type 6H-SiC crystals. The electron paramagnetic resonance study of these defects has been performed in the temperature range of 4.2300 K at... (Read more)
- 95. Phys. Rev. B 71, 035213 (2005) , “Possibility for the electrical activation of the carbon antisite by hydrogen in SiC”, A. Gali, P. Deák, N. T. Son, and E. JanzénCalculations predict the carbon antisite to be the most abundant intrinsic defect in silicon carbide in a wide range of doping. The isolated carbon antisite is, however, optically and electronically inactive, therefore, difficult to observe by usual experimental techniques. However, CSi... (Read more)
- 96. Proc. SPIE 6020, 60203D (2005) , “Effect of radio frequency bias on the optical and structural properties of nanocrystalline SiC films deposited by helicon wave plasma enhanced chemical vapor deposition”, Wei Yu, Chunsheng Wang, Wanbing Lu, Shuangkui Cui, Guangsheng FuNanocrystalline cubic silicon carbide thin films have been fabricated by helicon wave plasma enhanced chemical vapor deposition (HWP-CVD) on Si and Corning 7059 glass substrates using the mix plasma of SiH4, CH4, and H2. The effect of negative radio-frequency (rf) bias voltage on the optical and... (Read more)
- 97. Proc. SPIE 5732, 77 (2005) , “Growth of carbon nanotubes by sublimation of silicon carbide substrates”, William C. Mitchel, John Boeckl, David Tomlin, Weijie Lu, John Riqueur, Jonathan ReynoldsAligned carbon nanotubes (CNT"s) have been found to form on both the Si and C faces of silicon carbide (SiC) wafers at high temperature. The CNT"s form when the SiC wafer is exposed to temperatures in the range 1400-1700°C under moderate vacuum. The CNT"s are aligned roughly... (Read more)
- 98. Semiconductors 39, 709 (2005) , “Structural Defects and Electrical Conductivity in Nanocrystalline SiC:H Films Doped with Boron and Grown by Photostimulated Chemical-Vapor Deposition”, O. I. Shevaleevskiy, S. Y. Myong, K. S. Lim, S. Miyajima, M. KonagaiThe paramagnetic DB defects and dark conductivity σd in films of nanocrystalline hydrogenated silicon doped with boron and carbon (nc-SiC:H) and grown by photostimulated chemical vapor deposition are studied. It is shown that an increase in the doping level leads to a phase transition from the crystalline structure to an amorphous structure. The electrical conductivity increases as the doping level increases and attains the value of σd = 5.5 × 10-2 Ω-1 cm-1; however, the conductivity decreases once the phase transition has occurred. The concentration of DB defects decreases steadily as the doping level increases and varies from 1019 cm-3 (in the crystalline structure) to 9×1017 cm-3 (in the amorphous structure). (Read more)
- 99. Appl. Phys. Lett. 85, 926 (2004) , “Atomic cracks and (2×2×)-R30° reconstruction at 6H-SiC(0001) surface”, E. Amy, P. Soukiassian, C. BrylinskiWe investigate the Si-rich 3×3 to Si-terminated × phase transition of the 6H-SiC(0001) surface by atom-resolved scanning tunneling microscopy. We find a 2×2-R30° reconstruction, coexisting with few 3×3 domains. While a high-quality 3×3 surface preparation is... (Read more)
- 100. Appl. Phys. Lett. 85, 5209 (2004) , “Cross-sectional structure of carrot defects in 4H–SiC epilayers”, X. Zhang, S. Ha, M. Benamara, M. Skowronski, M. J. O’Loughlin, J. J. SumakerisSurface morphology of carrot defects in 4HSiC epilayers is described based on optical microscopy and molten potassium hydroxide etching. Its crystallographic structure is investigated using cross-sectional transmission x-ray topography. A threading screw dislocation in substrate serves as the... (Read more)
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