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- 1. Appl. Phys. Lett. 89, 012508 (2006) , “Ferromagnetism in Fe-implanted a-plane ZnO films”, P. Wu, G. Saraf, Y. Lu, D. H. Hill, R. Gateau, L. Wielunski, R. A. Bartynski, D. A. Arena, J. Dvorak, A. Moodenbaugh, T. Siegrist, J. A. Raley, and Yung Kee YeoFe ions of dose 5×1016 cm2 were implanted at 200 keV into a-plane ZnO epitaxial films. The epitaxial quality of the postannealed samples was verified by x-ray diffraction -rocking curves and scans, whereas x-ray absorption spectroscopy identified the... (Read more)
- 2. J. Appl. Phys. 99, 103905 (2006) , “Effect of Mn+ ion implantation on the Raman spectra of ZnO”, Hongmei Zhong, Jinbing Wang, Xiaoshuang Chen, Zhifeng Li, Wenlan Xu, and Wei LuRaman measurements have been performed on ZnO bulk materials implanted with 220 keV Mn+ ions with various doses from 1015 to 1017 cm2. The results reveal two modes at about 230 and 523 cm1, respectively, which are not observed in... (Read more)
- 3. J. Appl. Phys. 99, 093507 (2006) , “Annealing process of ion-implantation-induced defects in ZnO: Chemical effect of the ion species”, Z. Q. Chen, M. Maekawa, A. Kawasuso, S. Sakai, and H. NaramotoZnO single crystals implanted with O+ and B+ ions were studied by positron annihilation and Raman scattering measurements. Positron annihilation results show that vacancy clusters are generated by implantation. For the B+-implanted sample, the vacancy clusters have a... (Read more)
- 4. Phys. Rev. B 74, 161202 (2006) , “Deactivation of Li by vacancy clusters in ion-implanted and flash-annealed ZnO”, T. Moe Børseth, F. Tuomisto, J. S. Christensen, W. Skorupa, E. V. Monakhov, B. G. Svensson, and A. Yu. KuznetsovLi is present in hydrothermally grown ZnO at high concentrations and is known to compensate both n- and p-type doping due to its amphoteric nature. However, Li can be manipulated by annealing and ion implantation in ZnO. Fast, 20 ms flash anneals in the 9001400 °C range... (Read more)
- 5. Phys. Rev. B 74, 045208 (2006) , “Defects in virgin and N+-implanted ZnO single crystals studied by positron annihilation, Hall effect, and deep-level transient spectroscopy”, G. Brauer, W. Anwand, W. Skorupa, J. Kuriplach, O. Melikhova, C. Moisson, H. von Wenckstern, H. Schmidt, M. Lorenz, and M. GrundmannHigh-quality single crystals of ZnO in the as-grown and N+ ion-implanted states have been investigated using a combination of three experimental techniquesnamely, positron lifetime/slow positron implantation spectroscopy accompanied by theoretical calculations of the positron... (Read more)
- 6. Appl. Phys. Lett. 87, 211912 (2005) , “Deep-level emissions influenced by O and Zn implantations in ZnO”, Q. X. Zhao, P. Klason, M. Willander, H. M. Zhong, W. Lu, J. H. YangA set of bulk ZnO samples implanted with O and Zn at various densities were investigated by photoluminescence. The implantation concentration of O and Zn is varied between 1×1017/cm3 and 5×1019/cm3. The samples were thermally treated in an... (Read more)
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Updated at 2010-07-20 16:50:39
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