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J. Appl. Phys. 100, 094108 (2006) ,
“The effect of interfacial layer properties on the performance of Hf-based gate stack devices”, G. Bersuker, C. S. Park, J. Barnett, P. S. Lysaght, P. D. Kirsch, C. D. Young, R. Choi, B. H. Lee, B. Foran, K. van Benthem, S. J. Pennycook, P. M. Lenahan, and J. T. Ryan
HfO2 Si SiO2| EPR HREM/TEM electric-field-effect electrical-meas. thermal-meas./anneal-exp.| E' Hafnium NBTI Oxygen Pb0 Pb1 Silicon device dielectric interface p-type | last update: Takashi Fukushima
- last updated at 2010-06-14 17:19:46
- 2010-06-14 17:19:46 Takashi Fukushima, University of Tsukuba, HfO2 Si SiO2 | electric-field-effect electrical-meas. thermal-meas./anneal-exp. HREM/TEM EPR | Hafnium Oxygen Pb0 Pb1 E' Silicon device p-type NBTI interface dielectric
All papers (3399)
Updated at 2010-07-20 16:50:39
Updated at 2010-07-20 16:50:39
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Materials
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Others(101 tags)
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Technique
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Details
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Bond(35 tags)
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Defect(interstitial)(18 tags)
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Defect-type(19 tags)
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Element(65 tags)
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Energy(8 tags)
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Isotope(56 tags)
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Label(303 tags)
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Sample(17 tags)
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Spin(8 tags)
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Symmetry(15 tags)
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